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Recent Webcasts


 

Tips, Tricks, and Traps of Semiconductor

Capacitance-Voltage (C-V) Testing


This seminar follows up on the material presented in the Semiconductor C-V Testing Fundamentals seminar (link to the previous seminar). It is designed to help laboratory engineers implement, troubleshoot, and verify C-V measurement systems. The seminar will discuss the keys to getting good C-V measurement results. Topics to be discussed include system setup and results from some extended C-V applications, such as high voltage C-V and quasistatic C-V.

Click here to register and view this seminar.




How to Get the Most from

Your Low Current Measurement Instruments


This seminar is designed to cover the the basics of low current (from nA to fA) electrical measurements, including how to select the right current measurement instrument, practical ways to reduce current noise in measurement setups, and how to quantify subtle sources of noise. These measurement best practices are important for applications in semiconductor material/device characterization, nanoscience test and measurement, optoelectronic device characterization, and many more. Application examples where such sensitive measurements are required will be discussed, together with a discussion of recent innovative test equipment solutions.

Click here to register and view this seminar.




Advanced Measurement Techniques

for OFDM and MIMO Based Systems


Advanced OFDM (Orthogonal Frequency Division Multiplex) technologies impose additional challenges and requirements for testing new wireless communication devices and systems. This paper compares and contrasts traditional single-carrier modulation schemes with multi-carrier OFDM schemes to understand the test equipment and measurement considerations when using modern vector signal generators and analyzers. It covers in detail spectrum, power, and modulation quality measurements and techniques for R&D and high-speed production test applications. The paper covers testing of both SISO (single-input, single-output) and MIMO (multiple-input, multiple-output) communications systems used in 802.11n WLAN, 802.16e mobile-WiMAX Wave 2, which are also applicable to future LTE and UMB cellular standards.  Note: This is Part Two of a two-part seminar.  See below for Part One:  "An Introduction to Orthogonal Frequency Division Multiplex Technology".

Click here to register and view this seminar.




Parallel Wafer Level Reliability (WLR) Basics 


This seminar is focused on examining the benefits and tradeoffs associated with parallel test solutions for wafer level reliability (WLR.) WLR tests are commonly used throughout the semiconductor lifecycle from technology development and process integration, to process reliability monitoring. The speed and accuracy of the WLR testing significantly impacts time to market for new designs. Parallel WLR testing provides a tool to significantly accelerate throughput by providing statistically significant samples sooner. Parallel WLR test solutions provide throughput benefits for both traditional and advance WLR measurements.

Click here to register and view this seminar.




An Introduction to Orthogonal Frequency
Division Multiplex Technology


Commercial radio technology has reached a new inflection point. The communications market and the underlying technology that provides voice and data services are evolving to provide higher data rates in the same frequency spectrum to ever more users. This seminar provides an overview of the changes occurring in the RF communications industry and the new technologies being developed: OFDM (Orthogonal Frequency Division Multiplex), OFDMA (Orthogonal Frequency Division Multiple Access), and MIMO (multiple-input, multiple-output). It covers the fundamentals of these new technologies, shows how these technologies are used in the WiMAX and WLAN standards, and discusses the test challenges and new test techniques for these technologies.  Note: This is Part One of a two-part seminar.  See  above for Part Two:  "Advanced Measurement Techniques for OFDM and MIMO Based Systems".

Click here to register and view this seminar.





Meet new challenges of semiconductor parameters measurement-ACS Keithley solution


THIS SEMINAR IS PRESENTED IN CHINESE ONLY

With the development of semiconductor foundry step into 45nm process, High-K/ metal gate material are commonly used. Whether test engineers in IC design house or in foundry, they all face more and more big challenges because of the never-ending changes and improvement of the new technologies.

Click here to register and view this seminar.




Semiconductor Capacitance-Voltage (C-V) Testing Fundamentals Webcast

 

This seminar is designed to introduce the topic of C-V measurements as they relate to semiconductor device and materials characterization. C-V testing is commonly used to determine semiconductor parameters such as doping profiles, density of interface states, threshold voltages, oxide charge, and carrier lifetime.  This informative 45-minute seminar is followed by an interactive Q&A (during live broadcast only) where you can ask the presenter for additional insight on this important topic.

Click here to register and view this seminar.

 



Design Considerations for Maximizing Throughput and Accuracy in Switch/Measure Instrumentation


This seminar offers insights into the speed vs. accuracy trade-offs involved in making multi-channel measurements with a digital multimeter (DMM) and relay switching. We’ll explore the various interactions between these instruments, such as signal errors caused by switching hardware, improper instrument coordination, measurement compensation techniques, and automated scanning. 
Click here to register and view this seminar. 

 


 

Archived Webcasts



General Test and Measurement



Low Level Measurements



Nanotechnology



    Semiconductor




    Wireless/RF




    Other Seminars








      上次修改时间: 2008-06-28